Scrubber system/Purifier

Scrubber system

Scrubber system prevents the environmental problem caused by air pollution.
The use of the system is as follows:

*Dealing with toxic gases detoxified
*Safety release of combustibility gases
*Decomposing disposal global warming gas
*Dealing with vice-generative production generated by manufacturing equipments detoxified.

There are disposal methods, burning, heating, catalyst decomposition, absorbing, wet, and plasma decomposition method.
Through our long experiences in semiconductor industries and gas business, we are proud to select Scrubber equipments from wide range to meet the needs and the purpose of each customer.
Scrubber system

Classifying into electronics industries

Classifying into electronics industries

Classifying into scrubber method

Classifying into use of scrubber system

Classifying into use of scrubber system

We propose and suggest the best scrubber system to meet the needs of customer.

TOC(Total Cost Ownership) cost balance assessment

We asses the costs that suppose to occur in the future by converting into scrubber basis price, main costs for 5 years, and maintenance parts costs for 5 years.

Efficiency and technical valuation

We asses the costs that suppose to occur in the future by converting into scrubber basis price, main costs for 5 years, and maintenance parts costs for 5 years.

Safety・Steady operation assessments

We consider gas properties and asses the safety operation such as maintenance system, periodic, method, achievements after the installation and continuous operation.

Purifier

An indispensable purifier to the electronics factory.
We can propose the best purifying method and device from various manufacturers' types.
We offer the purifier for the special material gases such as NH3 and HCL, and the air or N2 purifier for the ArF liquid soak stepper.
■Removed : N2、O2、CO、CO2、CH4、H2、H2O、Particle
■Guaranteed : ≦1ppb
Purifier

The removed substance and guaranteed value are different case by case, the final guarantee can be decided by the customer's conditions.

Method Purified Bulk Gas Purified Flow Rate
N2 O2 Ar H2 He
Adsorption 3〜6,000 Nm3/hr
Getter   0.3〜50 Nm3/hr
Cryogenic       10〜500 Nm3/hr
Palladium Metal Membranes         0.1〜40Nm3/hr